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NIHONWELD N-8016-G
AWS Specification: AWS A5.5 E8016-G
JIS Specification:

D5316

Other Specification:

 

I. APPLICATIONS:

For 520-570 N/mm2 High Tensile Steel of ships, machinery and bridges.

II. DESCRIPTIONS:

An extra low hydrogen type electrode for all-position welding of 520-490N/mm2 high tensile steel for low temperature service.

III. NOTES ON USAGE:

  • Dry the electrodes at 300-350ºC for one hour before use.

  • Take the backstep method or strike the arc on a small steel plate prepared to prevent blowholes at the arc starting.

  • Keep the arc as short as possible.

IV. TYPICAL CHEMICAL COMPOSITION OF DEPOSITED METAL (%):

 

C

Si

Mn

P

S

Ni

0.08

0.5

1.28

0.012

0.010

0.62

V. TYPICAL MECHANICAL PROPERTIES OF DEPOSITED METAL:

 

Yield Point

N/mm2 (ksi)

Tensile Strength

N/mm2 (ksi)

Elongation

%

Impact Value

°C, J (°F, Ft-Lbs)

530 (77)

640 (93)

29

-29°, 120 (-20°, 89)

VI. WELDING POSITIONS: ALL POSITIONS

VII. SIZES & RECOMMENDED CURRENT RANGE: AC or DC (+)

 

 

Dia. x length (mm)

2.5 x 350

3.2 x 350

4.0 x 350

5.0 x 350

Current Range (Amp)

Flat

55 - 85

90 - 130

135 - 185

190 - 250

Vertical, Overhead

50 - 80

80 - 120

110 - 160

165 - 210

TEST RESULT

The information contained or otherwise referenced herein is presented only as “typical” without guarantee or warranty, and Industrial Welding Corporation expressly disclaims any liability incurred from any reliance thereon. Typical data and Test results for mechanical properties, deposit or electrode composition and other properties were obtained from a weld produced and tested according to prescribed standards, and should not be assumed to be the expected results in a particular application or weldment. Actual results will vary depending on many factors, including, but not limited to, weld procedure, plate chemistry and temperature, weldment design and fabrication methods. Users are cautioned to confirm by qualification testing, or other appropriate means, the suitability of any welding consumable and procedure before use in the intended application.